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Proceedings Paper

Novel antireflection method with gradient photoabsorption for optical lithography
Author(s): Toshihiko P. Tanaka; Naoko Asai; Shou-ichi Uchino
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Paper Abstract

A new concept using the bottom antireflection layer with graded photoabsorption named GALA (gradient absorption layer) is described to resolve the problems with conventional antireflection methods, such as insufficient antireflection, substrate material, and structure dependence. The antireflection layer with high photoabsorption at the bottom eliminates the light reflected from the substrate and the graded photoabsorption suppresses the surface reflection of the layer. This new method can achieve extremely low reflection (less than 3 percent) for all substrates.

Paper Details

Date Published: 7 June 1996
PDF: 10 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240926
Show Author Affiliations
Toshihiko P. Tanaka, Hitachi, Ltd. (Japan)
Naoko Asai, Hitachi, Ltd. (Japan)
Shou-ichi Uchino, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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