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Proceedings Paper

Overview of photothermal characterization of optical thin film coatings
Author(s): Zhouling Wu; Marshall Thomsen; Pao-Kuang Kuo; Y. S. Lu; Christopher J. Stolz; Mark R. Kozlowski
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Paper Abstract

Photothermal techniques are widely used in thin film characterizations and are particularly useful in studying laser-induced damage in optical coatings. The specific applications include measuring weak absorption, characterizing thermal conductivity, detecting local defects, as well as monitoring laser-interaction dynamics and determining laser damage thresholds. In this paper we take an overview of the principle of photothermal techniques, the various detection methods, and the progress made during laser decade in applying these techniques to optical thin films. Further potential and limitations of the techniques will also be discussed, with emphasis on in-situ studies of laser-interaction with thin films and local defects.

Paper Details

Date Published: 27 May 1996
PDF: 17 pages
Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240409
Show Author Affiliations
Zhouling Wu, Eastern Michigan Univ. (United States)
Marshall Thomsen, Eastern Michigan Univ. (United States)
Pao-Kuang Kuo, Wayne State Univ. (United States)
Y. S. Lu, Wayne State Univ. (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Mark R. Kozlowski, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 2714:
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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