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Proceedings Paper

Inclusion and overlayer effects on the electric fields in dielectric films
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Paper Abstract

The surface and bulk microstructures inherent to the fabrication process of dielectric films, affects both the distribution of the local electric field intensities and its associated dielectric properties. In this paper, we have used a finite element electric field model to examine the effects of a low dielectric surface layer, alignment of a low dielectric component within the dielectric film, and the interaction of these two influences on the local electric fields and dielectric constants. Columnar microstructure and alignment of dielectric components perpendicular to the surface norm are shown to enhance electric intensities and dielectric constants. Predicted dielectric constants are compared against conventional effective medium approximation results.

Paper Details

Date Published: 27 May 1996
PDF: 10 pages
Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240385
Show Author Affiliations
Kim F. Ferris, Pacific Northwest National Lab. (United States)
Gregory J. Exarhos, Pacific Northwest National Lab. (United States)
Steven M. Risser, East Texas State Univ. (United States)


Published in SPIE Proceedings Vol. 2714:
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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