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Proceedings Paper

Rapid and accurate measurements of photoresist refractive index dispersion using the prism coupling method
Author(s): Robert A. Norwood; Lisa A. Whitney
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Paper Abstract

A commercially available instrument (MetriconTM 2010) was used to perform refractive index measurements at wavelengths of 543 nm, 632.8 nm and 780 nm on AZR photoresist and antireflection (AR) coating products. This instrument is computer-controlled and performs all analyses required to determine film indices and thicknesses. The samples were various i-line and g-line photoresists and AR coatings, spun onto silicon at thicknesses of approximately 1 - 2 microns. The reproducibility of the refractive index measurements at different spots on a given sample was found to be very high (usually less than 0.0002) and the time to measure one sample at all the wavelengths was about 15 minutes. The data were fit to a Cauchy function and low error fits were obtained. Most photoresists measured exhibited similar values for the Cauchy coefficients, while BARLiTM had much different coefficients, owing to its large absorption in the visible.

Paper Details

Date Published: 21 May 1996
PDF: 8 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996);
Show Author Affiliations
Robert A. Norwood, AlliedSignal Inc. (United States)
Lisa A. Whitney, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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