Share Email Print

Proceedings Paper

Efficient overlay optimization of stepper correctables
Author(s): Warren W. Flack; Susan Avlakeotes; David Chen; Gary E. Flores
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A crucial aspect of overlay optimization is proper selection of stepper input corrections. Automated metrology systems provide the ability to rapidly amass extensive overlay data on lithography systems and processes. The data can then be used to provide feedback in the form of stepper input correction terms to improve overlay. A common approach is an analysis of the overlay data using conventional grid and lens models to determine apparent corrections to be applied to the stepper. However, the standard models do not necessarily account for all the variability in the measured data. Determination of optimal corrections is further complicated by cross-correlation of the stepper input correctable terms. In these cases, the simple application of the grid and lens modeled terms will not provide optimal results. The use of efficient experimental design techniques can reduce the large uncertainty involved in determining and applying these stepper input corrections. Using traditional experimental factorial and response surface design techniques, a descriptive model was developed for the six grid correction terms. The resulting empirical model was generated by using a six factor Box-Behnken experimental design. Multiple wafers were run at these conditions and overlay was measured using an automated metrology system. This empirical model was used to derive the optimal set of inputs to the stepper. This descriptive model is compared with input settings determined from a conventional grid model.

Paper Details

Date Published: 21 May 1996
PDF: 14 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996);
Show Author Affiliations
Warren W. Flack, Ultratech Stepper, Inc. (United States)
Susan Avlakeotes, Ultratech Stepper, Inc. (United States)
David Chen, Ultratech Stepper, Inc. (United States)
Gary E. Flores, Ultratech Stepper, Inc. (United States)

Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?