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Proceedings Paper

Image paradigm for semiconductor defect data reduction
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Paper Abstract

Automation tools for semiconductor defect data analysis are becoming necessary as device density and wafer sizes continue to increase. These tools are needed to efficiently and robustly process the increasing amounts of data to quickly characterize manufacturing processes and accelerate yield learning. An image-based method is presented for analyzing process 'signatures' from defect data distributions. This paper describes the statistical and morphological image processing methods used to achieve an automated segmentation of signature events into high-level process-oriented categories. Applications are presented for enhanced statistical process control, automatic process characterization, and intelligent subsampling of event distributions for off-line, high-resolution defect review.

Paper Details

Date Published: 21 May 1996
PDF: 12 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240084
Show Author Affiliations
Kenneth W. Tobin Jr., Oak Ridge National Lab. (United States)
Shaun S. Gleason, Oak Ridge National Lab. (United States)
Thomas P. Karnowski, Oak Ridge National Lab. (United States)
Hamed Sari-Sarraf, Oak Ridge National Lab. (United States)
Marylyn Hoy Bennett, SEMATECH/Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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