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Proceedings Paper

UV laser beam shaping by multifaceted beam integrators: fundamental principles and advanced design concepts
Author(s): Thomas F. E. Henning; Lars Unnebrink; Marcus Scholl
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Paper Abstract

Many applications of micromachining with UV excimer lasers requires homogeneous illumination of a mask or a workpiece or even illumination by a process adapted beam profile. In this paper the performance of multifaceted beam integrators for UV wavelength is analyzed. A simple model for the coherence function of excimer laser radiation is set up and checked experimentally. The model is used to examine the performance of the two different integrator concepts: the non-imaging multifaceted beam integrator and the imaging integrator. The theoretical analysis shows that the homogenization of laser radiation with a low spatial coherence, which is typical for UV lasers, is performed best by the imaging integrator. However, the non-imaging integrator is shown to offer the possibility for process adapted beam shaping by beam integration with beamlet shaping. Arbitrary process adapted beam profiles are generated by specific structuring of the facets. Beam integration ensures independence of the incoming beam. The success of this concept is demonstrated in an experiment. The known problems by beam transformation with diffractive optical elements are overcome by this new concept.

Paper Details

Date Published: 8 April 1996
PDF: 12 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237772
Show Author Affiliations
Thomas F. E. Henning, RWTH Aachen (Germany)
Lars Unnebrink, RWTH Aachen (Germany)
Marcus Scholl, RWTH Aachen (Germany)

Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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