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Proceedings Paper

UV photosensitivity in PECVD-grown germanosilicate waveguides
Author(s): David J. Moss; Mike V. Bazylenko; Mark Gross; Pak Lim Chu; Marcy Faith; Patrick W. Leech; P. Kemeny; Morten Ibsen; Otto Leistiko; C. V. Poulson; John D. Love; Francois J. Ladouceur
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Paper Abstract

We demonstrate all optically (UV) written waveguide grating structures in germanosilicate trilayers grown by conventional PECVD, as well as novel results with a new hollow cathode PECVD growth technique which is capable of producing films having either positive or negative UV photosensitivity.

Paper Details

Date Published: 8 April 1996
PDF: 9 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237769
Show Author Affiliations
David J. Moss, Univ. of Sydney (Australia)
Mike V. Bazylenko, Univ. of New South Wales (Australia)
Mark Gross, Univ. of New South Wales (Australia)
Pak Lim Chu, Univ. of New South Wales (Australia)
Marcy Faith, Telecom Research Labs. (Australia)
Patrick W. Leech, Telecom Research Labs. (Australia)
P. Kemeny, Telecom Research Labs. (Australia)
Morten Ibsen, Mikroelectronik Ctr. (Denmark)
Otto Leistiko, Mikroelectronik Ctr. (Denmark)
C. V. Poulson, Mikroelectronik Ctr. (Denmark)
John D. Love, Australian National Univ. (Australia)
Francois J. Ladouceur, Australian National Univ. (Australia)

Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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