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Proceedings Paper

Practical consequences of matching real laser sources to target illumination requirements
Author(s): Glenn Ogura; Rod Andrew; Ronald D. Schaeffer
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Paper Abstract

UV laser processing as an industrial production step generally requires the beam illumination of target or mask to be of well-defined resolution, intensity and uniformity, and above all reproducible over long periods of time. Real excimer laser sources, despite major improvements over recent years, still deliver beams of non-uniform intensity profile with different beam divergence in each axis. This paper deals with practical approaches to excimer laser energy control, beam shaping and beam homogenization, and the matching of beam illumination optics to projection imaging optics.

Paper Details

Date Published: 8 April 1996
PDF: 11 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237757
Show Author Affiliations
Glenn Ogura, OPTEC SA (Belgium)
Rod Andrew, OPTEC SA (Belgium)
Ronald D. Schaeffer, Resonetics, Inc. (United States)

Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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