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Proceedings Paper

Pulsed laser deposition of thick films of electronic ceramics (Review Paper)
Author(s): Douglas B. Chrisey; Paul C. Dorsey; James S. Horwitz; Lee A. Knauss; Raymond C. Y. Auyeung
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Paper Abstract

Pulsed laser deposition is a superior technique for the growth of high quality thin films (<EQ 1 micrometers ) of electronic ceramics and has satisfied many applications. To meet developing applications, there is a need for thick films (>= 1 micrometers ) of electronic ceramics. Two film qualities principally control the growth of thick films: the film surface morphology and film stress. The deposition parameters which affect these qualities include: film deposition rate, film-substrate lattice mismatch, film-substrate thermal coefficient of expansion mismatch, and film growth kinetics. Our results suggest that it will be difficult to fabricate thick ceramic films of suitable electronic quality by conventional physical vapor deposition techniques.

Paper Details

Date Published: 8 April 1996
PDF: 12 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237750
Show Author Affiliations
Douglas B. Chrisey, Naval Research Lab. (United States)
Paul C. Dorsey, Naval Research Lab. (United States)
James S. Horwitz, Naval Research Lab. (United States)
Lee A. Knauss, Naval Research Lab. (United States)
Raymond C. Y. Auyeung, SFA, Inc. (United States)

Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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