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Proceedings Paper

Laser induced chemical processing of electronic materials
Author(s): Mikio Takai; Susumu Namba
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Paper Abstract

Laser induced maskless etching has been applied to compound semiconductors and ceramics. Maximum etching rates ranging from 0. 1 tim/s to 850 tim/s with a minimum width of submicron depending on etching reaction were obtained. In-situ deposition and fluorescence were found to take place for thermochemical etching of compound semiconductors in CC14 atmospheres in which a minimum temperature rise necessary for etching reaction was clarified. Stoichiometry change and residual damage after etching were observed by microprobe photoluminescence and Raman scattering measurement. Laser chemical processing could for the first time be applied to magnetic head fabrication using Mn-Zn ferrite. 1.

Paper Details

Date Published: 1 October 1990
PDF: 11 pages
Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23727
Show Author Affiliations
Mikio Takai, Osaka Univ. (Japan)
Susumu Namba, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 1352:
1st Intl School on Laser Surface Microprocessing
Ian W. Boyd; Vitali I. Konov; Boris S. Luk'yanchuk, Editor(s)

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