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Proceedings Paper

Positive photoresist ablation with excimer laser
Author(s): Moishe S. Kitai; Valerie L. Popkov; Vladimir A. Semchishen
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Paper Abstract

The quantitative model of PHMA ablation is developed. The photochemical reactions heating of the polymer film and mechanical stresses are taken into consideration. The increasing of the optical absorption during the photochemical reaction caused by excimer laser is investigated. The developed model allowed to evalute the ablation parameters and to estimate the spatial resolution of this process. 1.

Paper Details

Date Published: 1 October 1990
PDF: 9 pages
Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23717
Show Author Affiliations
Moishe S. Kitai, Scientific Research Ctr. for Technological Lasers (Russia)
Valerie L. Popkov, Scientific Research Ctr. for Technological Lasers (Russia)
Vladimir A. Semchishen, Scientific Research Ctr. for Technological Lasers (Russia)


Published in SPIE Proceedings Vol. 1352:
1st Intl School on Laser Surface Microprocessing
Ian W. Boyd; Vitali I. Konov; Boris S. Luk'yanchuk, Editor(s)

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