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Proceedings Paper

Nanoscale processing by gas-cluster ion beams: novel technique in ion-beam processing
Author(s): Isao Yamada; Jiro Matsuo
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Paper Abstract

Gas cluster ion beam techniques have been developed for nanoscale surface processing. Bombarding process fundamentals are distinctly different than those produced by conventional monomer ion irradiation. The unique characteristics of gas cluster ion bombardment are low energy and high current effects. Multiple collision during the bombardment solid surface produces complicate nonlinear effects. Very shallow ion implantation, low damage and high rate lateral sputtering and low temperature thin film formation are suggested application fields and have been experimentally demonstrated.

Paper Details

Date Published: 26 April 1996
PDF: 6 pages
Proc. SPIE 2779, 3rd International Conference on Intelligent Materials and 3rd European Conference on Smart Structures and Materials, (26 April 1996); doi: 10.1117/12.237050
Show Author Affiliations
Isao Yamada, Kyoto Univ. (Japan)
Jiro Matsuo, Kyoto Univ. (Japan)


Published in SPIE Proceedings Vol. 2779:
3rd International Conference on Intelligent Materials and 3rd European Conference on Smart Structures and Materials
Pierre Francois Gobin; Jacques Tatibouet, Editor(s)

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