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Proceedings Paper

Defect analysis with black beam interferometry
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Paper Abstract

The method of Black BeamR Interferometry, which was developed for inspection of glass substrates in LCD manufacturing, is extended in order to achieve a detailed description and classification of defects and other features on the surface under inspection. With a properly arranged detection system, not only a high defect detectability is provided, but also the ability to discriminate between the up or down defects (bumps or pits) in addition to the possibility of measuring the defect geometry (for large defects or structures) and the equivalent defect volume. The method is described and the results of simulations and experiments are presented.

Paper Details

Date Published: 11 March 1996
PDF: 9 pages
Proc. SPIE 2651, Liquid Crystal Materials, Devices, and Applications IV, (11 March 1996);
Show Author Affiliations
Gregory Toker, Display Inspection Systems (United States)
Andrei Brunfeld, Display Inspection Systems (United States)

Published in SPIE Proceedings Vol. 2651:
Liquid Crystal Materials, Devices, and Applications IV
Ranganathan Shashidhar, Editor(s)

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