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Proceedings Paper • Open Access

A split algorithm of manufacturing stencil mask and dividing pattern for making holographic optical elements (Withdrawal Notice)

Paper Abstract

Publisher’s Note: This manuscript, originally published on 2 November 2018, has been withdrawn by the publisher for editorial reasons.

Paper Details

Date Published: 2 November 2018
PDF: 1 pages
Proc. SPIE 10818, Holography, Diffractive Optics, and Applications VIII, 108181E (2 November 2018); doi: 10.1117/12.2327054
Show Author Affiliations
Yuta Aoki, Konan Univ. (Japan)
Kunio Sakamoto, Konan Univ. (Japan)

Published in SPIE Proceedings Vol. 10818:
Holography, Diffractive Optics, and Applications VIII
Yunlong Sheng; Chongxiu Yu; Changhe Zhou, Editor(s)

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