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Proceedings Paper

Deposition durability of e-beam mask repair
Author(s): Thorsten Krome; Christian Holfeld; Tim Göhler; Pavel Nesladek
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Paper Abstract

The durability of deposition repairs of two different e-beam mask repair tools has been examined and compared in this work. To obtain this data, clear defects on production masks have been repaired with both tools. In between these repairs the mask was used for production and gathered exposure dose accordingly. The increase of transmission and hence the degradation of the deposition has been determined by AIMSTM. We could confirm that one tool/process shows better stability of the depositions than the other.

Paper Details

Date Published: 19 September 2018
PDF: 6 pages
Proc. SPIE 10775, 34th European Mask and Lithography Conference, 1077511 (19 September 2018); doi: 10.1117/12.2323905
Show Author Affiliations
Thorsten Krome, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Christian Holfeld, GLOBALFOUNDRIES Dresden Module One, GmbH & Co. KG (Germany)
Tim Göhler, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Pavel Nesladek, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)

Published in SPIE Proceedings Vol. 10775:
34th European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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