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Proceedings Paper

Fabrication and performance at 1.33 nm of a 0.24-um period multilayer grating
Author(s): H. Berrouane; Chantal G. Khan Malek; Jean-Michel Andre; L. Lesterlin; F. R. Ladan; Jean-Rene Rivoira; Yves Lepetre; Robert J. Barchewitz
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Paper Abstract

We report on the fabrication of a multilayer linear grating, characterization in the soft x-ray region and modeling of its perfonnance. Holographic lithography was used to produce a 0.24 p.m spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lcz line (1.33 nm). The results were compared to the values calculated within the framework of a scalar kinematic diffraction theory of relief gratings.

Paper Details

Date Published: 1 February 1991
PDF: 9 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23230
Show Author Affiliations
H. Berrouane, Lab. de Chimie - Physique (France)
Chantal G. Khan Malek, Groupement Scientifique CNET (France)
Jean-Michel Andre, Lab. de Chimie - Physique (France)
L. Lesterlin, Groupement Scientifique CNET/CNRS (France)
F. R. Ladan, Groupement Scientifique CNET/CNRS (France)
Jean-Rene Rivoira, Univ. d'Aix-Marseille III (France)
Yves Lepetre, Univ. d'Aix-Marseille III (France)
Robert J. Barchewitz, Lab. de Chimie - Physique (France)

Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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