
Proceedings Paper
XMM space telescope: development plan for the lightweight replicated x-ray gratingsFormat | Member Price | Non-Member Price |
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Paper Abstract
An approach and development plan for the production of replicated variable line spacing X-ray reflection
gratings on lightweight substrates is described. The gratings will be arrayed in spectrometers to analyze
the soft X-rays gathered by the telescopes flown aboard the European Space Agency (ESA) "X-ray Multi-
Mirror Mission" (XMM). The mission requires about 750 gratings to form 3 arrays. Each array provides
a grating area of approximately 5 square meters. From relatively few master gratings, the low blaze angle
gratings will be replicated onto 55 gram substrates having an equivalent length/thickness aspect ratio □40.
We will describe the criteria used for selecting the substrate design and material. A multi-phased study to
solve identified technical problems associated with the replication of these gratings is also described. We
will report on the present status of the substrates and replication process.
Paper Details
Date Published: 1 February 1991
PDF: 8 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23229
Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography
PDF: 8 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23229
Show Author Affiliations
Richard C. Montesanti, Lawrence Livermore National Lab. (United States)
Dennis P. Atkinson, Lawrence Livermore National Lab. (United States)
Dennis P. Atkinson, Lawrence Livermore National Lab. (United States)
David F. Edwards, Lawrence Livermore National Lab. (United States)
Jeffrey L. Klingmann, Lawrence Livermore National Lab. (United States)
Jeffrey L. Klingmann, Lawrence Livermore National Lab. (United States)
Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography
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