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Proceedings Paper

Planar diffusion-based processes for the fabrication of integrated optical and electronic components
Author(s): Robert L. Thornton
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Paper Abstract

The discovery of the phenomenon of impurity induced layer disordering (IILD) has enabled novel device geometries to be applied to the task of patterning heterostructure layers for the realization of high performance optoelectronic devices. In this paper we will review progress in the various ways of implementing and controlling the IILD process, and discuss several of the potentially important device concepts for optoelectronic integration that are enabled by this technology.

Paper Details

Date Published: 1 December 1992
Proc. SPIE 1582, Integrated Optoelectronics for Communication and Processing, (1 December 1992); doi: 10.1117/12.2321802
Show Author Affiliations
Robert L. Thornton, Electronic Materials Lab. (United States)

Published in SPIE Proceedings Vol. 1582:
Integrated Optoelectronics for Communication and Processing
C.-S. Hong, Editor(s)

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