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Proceedings Paper

Synchronized real-space and frequency-domain low-coherence interferometry for wafer thickness and metrology applications
Author(s): Raphael Morency; Wei Chun Hung; Wojtek J. Walecki
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Paper Abstract

We discuss the application of new synchronized, and virtually synchronized multiprobe real space and frequency domain low coherence interferometers for measurement of wafer thickness and topography. The recently developed low coherence frequency domain interferometers have been proved to be fast and effective tool for measurement of wafer topography, thickness and individual layers within multilayer structures. In our paper we present simple models describing performance of multiprobe metrology and compare it with other solutions.

Paper Details

Date Published: 18 August 2018
PDF: 8 pages
Proc. SPIE 10749, Interferometry XIX, 107490Z (18 August 2018); doi: 10.1117/12.2317579
Show Author Affiliations
Raphael Morency, Frontier Semiconductor, Inc. (United States)
Wei Chun Hung, Frontier Semiconductor, Inc. (United States)
Wojtek J. Walecki, Frontier Semiconductor, Inc. (United States)

Published in SPIE Proceedings Vol. 10749:
Interferometry XIX
Katherine Creath; Jan Burke; Michael B. North Morris; Angela D. Davies, Editor(s)

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