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Proceedings Paper

Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures
Author(s): Masahito Niibe; Masami Hayashida; Takashi Iizuka; Akira Miyake; Yutaka Watanabe; Rie Takahashi; Yasuaki Fukuda
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Paper Abstract

We have previously reported that columnar-structures were formed in electron beam (EB) deposited and DCmagnetron sputtered Mo-Si layered synthetic microstructures (LSMs). The columnar structures reduced x-ray reflectivity by roughing layer interfaces of the LSMs. We here investigated the conditions to suppress columnar structure formation, by varying the substrate temperature (T9) in EB deposition and the argon pressure (PAT ) in D C- and RF-sputtering. In the EB deposited LSMs, the columnar structure disappeared and almost uniform LSMs were obtamed both at T□ 400°C and T9< -155°C. In the DC- and RF-sputtered LSMs, the columnar structure formation was suppressed by lowering PAr. The measured x-ray reflectivity of the LSMs increased according to the suppression of the columnar structure formation.

Paper Details

Date Published: 1 February 1991
PDF: 12 pages
Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); doi: 10.1117/12.23172
Show Author Affiliations
Masahito Niibe, Canon Research Ctr. (Japan)
Masami Hayashida, Canon Research Ctr. (Japan)
Takashi Iizuka, Canon Research Ctr. (Japan)
Akira Miyake, Canon Research Ctr. (Japan)
Yutaka Watanabe, Canon Research Ctr. (Japan)
Rie Takahashi, Canon Research Ctr. (Japan)
Yasuaki Fukuda, Canon Research Ctr. (Japan)

Published in SPIE Proceedings Vol. 1343:
X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography

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