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Proceedings Paper

Oxygen plasma etching of YAG crystals
Author(s): Giedrius Abromavičius; Naglis Kyžas; Alexandr Belosludtsev
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Paper Abstract

High surface quality of the optical elements is one of the key factors enabling their effective application in high power laser systems. In our work, commercially polished undoped YAG crystals were etched using low energy oxygen plasma. Surface roughness and optical properties were investigated using two different etching depths. Obtained results demonstrate smoothing of initial crystal surface and 1-4 % decrease of transmittance within UV-VIS spectral range.

Paper Details

Date Published: 7 June 2018
PDF: 5 pages
Proc. SPIE 10691, Advances in Optical Thin Films VI, 1069123 (7 June 2018); doi: 10.1117/12.2314456
Show Author Affiliations
Giedrius Abromavičius, Ctr. for Physical Sciences and Technology (Lithuania)
Naglis Kyžas, Ctr. for Physical Sciences and Technology (Lithuania)
Alexandr Belosludtsev, Ctr. for Physical Sciences and Technology (Lithuania)


Published in SPIE Proceedings Vol. 10691:
Advances in Optical Thin Films VI
Michel Lequime; H. Angus Macleod; Detlev Ristau, Editor(s)

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