Share Email Print

Proceedings Paper

Performance validation of Mapper's FLX-1200
Author(s): Marco Wieland; Guido de Boer; Pieter Brandt; Michel Dansberg; Remco Jager; Jerry Peijster; Erwin Slot; Stijn Steenbrink; Yoann Blancquaert; Stefan Landis; Laurent Pain; Jonathan Pradelles; Guido Rademaker; Isabelle Servin
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Mapper has installed its first product, the FLX–1200, at CEA-Leti in Grenoble (France). This is a maskless lithography system, based on massively parallel electron-beam writing with high-speed optical data transport for switching the electron beams. The FLX-1200, containing 65,000 parallel electron beams in a 13mm x 2mm electron optics slit, is capable of patterning any resolution and any different type of structure all the way down to 28 nm node patterns. As of August 2017 the FLX-1200 has a fully operational electron optics column, including a 65,000 beam blanker. In this paper the latest technical achievements of the FLX-1200 have been described: beam current is at 80% of FLX-1300 target (85 minutes per wafer). For 42nm hp dense lines a CDu of 8nm 3σ and a LWR of 5nm 3σ has been demonstrated. The stitching error is 12nm μ+3σ and regarding overlay a 15nm capability demonstrated, provided matching strategy is implemented and the mirror map is calibrated.

Paper Details

Date Published: 19 March 2018
PDF: 12 pages
Proc. SPIE 10584, Novel Patterning Technologies 2018, 105840G (19 March 2018); doi: 10.1117/12.2300816
Show Author Affiliations
Marco Wieland, MAPPER Lithography (Netherlands)
Guido de Boer, MAPPER Lithography (Netherlands)
Pieter Brandt, MAPPER Lithography (Netherlands)
Michel Dansberg, MAPPER Lithography (Netherlands)
Remco Jager, MAPPER Lithography (Netherlands)
Jerry Peijster, MAPPER Lithography (Netherlands)
Erwin Slot, MAPPER Lithography (Netherlands)
Stijn Steenbrink, MAPPER Lithography (Netherlands)
Yoann Blancquaert, CEA-LETI (France)
Stefan Landis, CEA-LETI (France)
Laurent Pain, CEA-LETI (France)
Jonathan Pradelles, CEA-LETI (France)
Guido Rademaker, CEA-LETI (France)
Isabelle Servin, CEA-LETI (France)

Published in SPIE Proceedings Vol. 10584:
Novel Patterning Technologies 2018
Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top