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Proceedings Paper

Gratings fabrication by ultraviolet light imprinting and embossing in a sol-gel silica glass
Author(s): J. E. Chisham; Mark P. Andrews; C.-Y. Li; S. Iraj Najafi; Alireza Malek-Tabrizi
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Paper Abstract

We present simple, low temperature methods for inexpensive fabrication of gratings in a photosensitive, organically modified silicate (ORMOSIL) system for integrated optical applications. The material is prepared by the sol-gel method. Gratings are made by UV imprinting through a mask and by an embossing technique. In the first case, UV exposure induces a refractive index change of (Delta) n equals 0.005 in the film and results in an index modulation type grating. Relief type gratings are made by mechanical embossing. Gratings are compared and characterized in terms of diffraction efficiency and grating period.

Paper Details

Date Published: 10 January 1996
PDF: 5 pages
Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); doi: 10.1117/12.229973
Show Author Affiliations
J. E. Chisham, McGill Univ. (Canada)
Mark P. Andrews, McGill Univ. (Canada)
C.-Y. Li, McGill Univ., Ecole Polytechnique de Montreal, and NZ Applied Technologies (Canada)
S. Iraj Najafi, Ecole Polytechnique de Montreal (Canada)
Alireza Malek-Tabrizi, Ecole Polytechnique de Montreal (Canada)

Published in SPIE Proceedings Vol. 2695:
Functional Photonic and Fiber Devices
S. Iraj Najafi; Mario Nicola Armenise, Editor(s)

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