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Proceedings Paper

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update
Author(s): Roderik van Es; Mark van de Kerkhof; Arthur Minnaert; Geert Fisser; Jos de Klerk; Joost Smits; Roel Moors; Eric Verhoeven; Leon Levasier; Rudy Peeters; Marco Pieters; Hans Meiling
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Paper Abstract

With the introduction of its fifth-generation NXE:3400B scanner, ASML brought EUV to High- Volume Manufacturing for 7 nm node lithography and beyond with full support of pellicle. This paper presents an update on lithographic performance results obtained with the NXE:3400B, characterized by an NA of 0.33, a Pupil Fill Ratio (PFR) of 0.2 and throughput capability of 125 wafers per hour. Advances in source power and system availability have enabled a continued increase of productivity. To maximize the number of yielding dies per day excellent Overlay, Focus, and Critical Dimension (CD) control have been realized, combining intrinsic tool stability with holistic control schemes. We will also show matching performance for both Overlay and Imaging, and further improvements in Focus Process Dependencies for the 5nm node.

Paper Details

Date Published: 19 March 2018
PDF: 12 pages
Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830H (19 March 2018); doi: 10.1117/12.2299503
Show Author Affiliations
Roderik van Es, ASML Netherlands B.V. (Netherlands)
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Arthur Minnaert, ASML Netherlands B.V. (Netherlands)
Geert Fisser, ASML Netherlands B.V. (Netherlands)
Jos de Klerk, ASML Netherlands B.V. (Netherlands)
Joost Smits, ASML Netherlands B.V. (Netherlands)
Roel Moors, ASML Netherlands B.V. (Netherlands)
Eric Verhoeven, ASML Netherlands B.V. (Netherlands)
Leon Levasier, ASML Netherlands B.V. (Netherlands)
Rudy Peeters, ASML Netherlands B.V. (Netherlands)
Marco Pieters, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 10583:
Extreme Ultraviolet (EUV) Lithography IX
Kenneth A. Goldberg, Editor(s)

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