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Proceedings Paper

New open platform software for monitoring lithography process of semiconductor manufacturing
Author(s): Yutaka Igarashi; Satoru Kikuchi; Levi Jordan; Kunihiko Abe; Yuji Minegishi
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Paper Abstract

The light source continues to play an important role in the evolution of semiconductor lithography - helping chip manufacturers to usher in their next generation nodes. Over the years, Gigaphoton has introduced innovative solutions to meet the various demands of the industry, including Injection Lock technology, active bandwidth control, and green technologies for conserving gas and electricity. Today, the needs of chip manufacturer have grown to become highly diverse and dynamic, because the set of challenges faced by each manufacturer is equally diverse and dynamic. This makes developing software solutions very challenging - as they must address a very broad scope of needs. At the same time, it is becoming increasingly important to gain a much deeper understanding of all aspects of how and to what level the light source is actively affecting each chip manufacturer’s wafer output - both in terms of yield and cost - for solutions and technologies to be effective and meaningful. However, there are many challenges to achieving this.

Paper Details

Date Published: 20 March 2018
PDF: 7 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 1058712 (20 March 2018); doi: 10.1117/12.2299491
Show Author Affiliations
Yutaka Igarashi, Gigaphoton Inc. (Japan)
Satoru Kikuchi, Gigaphoton Inc. (Japan)
Levi Jordan, Gigaphoton Inc. (Japan)
Kunihiko Abe, Gigaphoton Inc. (Japan)
Yuji Minegishi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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