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Proceedings Paper

EUV mask lifetime testing using EBL2
Author(s): Chien-Ching Wu; Edwin te Sligte; Herman Bekman; Arnold J. Storm; Michel van Putten; Maurice P.M. A. Limpens; Jacqueline van Veldhoven; Alex Deutz
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Paper Abstract

EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.

Paper Details

Date Published: 19 March 2018
PDF: 6 pages
Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058310 (19 March 2018); doi: 10.1117/12.2297369
Show Author Affiliations
Chien-Ching Wu, TNO (Netherlands)
Edwin te Sligte, TNO (Netherlands)
Herman Bekman, TNO (Netherlands)
Arnold J. Storm, TNO (Netherlands)
Michel van Putten, TNO (Netherlands)
Maurice P.M. A. Limpens, TNO (Netherlands)
Jacqueline van Veldhoven, TNO (Netherlands)
Alex Deutz, TNO (Netherlands)

Published in SPIE Proceedings Vol. 10583:
Extreme Ultraviolet (EUV) Lithography IX
Kenneth A. Goldberg, Editor(s)

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