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Proceedings Paper

Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam
Author(s): Hiroki Yamamoto; Takahiro Kozawa; Seiichi Tagawa; Jean-Louis Marignier; Mehran Mostafavi; Jacqueline Belloni
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Paper Abstract

Using an electron beam, thin polymeric films loaded with metal nanoparticles of silver were prepared by a one-step irradiation-induced reduction of the metal ions embedded in the polymer. The metal nanoparticles were observed by either optical absorption or microscopy. The mechanism of the reduction of metal ions and of the polymer crosslinking were deduced from the average absorbance measurements. In view of realizing specific patterns of high resolution using the electron beam, electron beam produces 200 nm wide lines that can be separated by unexposed spaces of adjustable width, where precursors were dissolved. The resolution of the electron beam has been exploited to demonstrate the achievement of nanopatterning on polymer films using a direct-writing process. This method supplies interesting applications such as masks, replicas, or imprint molds of improved density and contrast.

Paper Details

Date Published: 13 March 2018
PDF: 10 pages
Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861G (13 March 2018); doi: 10.1117/12.2297331
Show Author Affiliations
Hiroki Yamamoto, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Jean-Louis Marignier, Univ. Paris-Sud (France)
Mehran Mostafavi, Univ. Paris-Sud (France)
Jacqueline Belloni, Univ. Paris-Sud (France)

Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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