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Proceedings Paper • Open Access

Low aberration monolithic diffraction gratings for high performance optical spectrometers
Author(s): Peter Triebel; Tobias Moeller; Torsten Diehl; Alexandre Gatto; Alexander Pesch; Lars E. Erdmann; Matthias Burkhardt; Alexander Kalies

Paper Abstract

Gratings are the core element of the spectrometer. For imaging spectrometers beside the polarization sensitivity and efficiency the imaging quality of the diffraction grating is essential. Lenses and mirrors can be produced with lowest wavefront aberrations. Low aberration imaging quality of the grating is required not to limit the overall imaging quality of the instrument. Different types of spectrometers will lead to different requirements on the wavefront aberrations for their specific diffraction gratings. The wavefront aberration of an optical grating is a combination of the substrate wavefront and the grating wavefront. During the manufacturing process of the grating substrate different processes can be applied in order to minimize the wavefront aberrations. The imaging performance of the grating is also optimized due to the recording setup of the holography.

This technology of holographically manufactured gratings is used for transmission and reflection gratings on different types of substrates like prisms, convex and concave spherical and aspherical surface shapes, free-form elements. All the manufactured gratings are monolithic and can be coated with high reflection and anti-reflection coatings. Prism substrates were used to manufacture monolithic GRISM elements for the UV to IR spectral range preferably working in transmission. Besides of transmission gratings, numerous spectrometer setups (e.g. Offner, Rowland circle, Czerny-Turner system layout) working on the optical design principles of reflection gratings. The present approach can be applied to manufacture high quality reflection gratings for the EUV to the IR.

In this paper we report our latest results on manufacturing lowest wavefront aberration gratings based on holographic processes in order to enable at least diffraction limited complex spectrometric setups over certain wavelength ranges. Beside the results of low aberration gratings the latest achievements on improving efficiency together with less polarization sensitivity of diffractive gratings will be shown for different grating profiles.

Paper Details

Date Published: 25 September 2017
PDF: 6 pages
Proc. SPIE 10562, International Conference on Space Optics — ICSO 2016, 1056207 (25 September 2017); doi: 10.1117/12.2296116
Show Author Affiliations
Peter Triebel, Carl Zeiss Spectroscopy GmbH (Germany)
Tobias Moeller, Carl Zeiss Spectroscopy GmbH (Germany)
Torsten Diehl, Carl Zeiss Spectroscopy GmbH (Germany)
Alexandre Gatto, Carl Zeiss Jena GmbH (Germany)
Alexander Pesch, Carl Zeiss Jena GmbH (Germany)
Lars E. Erdmann, Carl Zeiss Jena GmbH (Germany)
Matthias Burkhardt, Carl Zeiss Jena GmbH (Germany)
Alexander Kalies, Carl Zeiss Jena GmbH (Germany)

Published in SPIE Proceedings Vol. 10562:
International Conference on Space Optics — ICSO 2016
Bruno Cugny; Nikos Karafolas; Zoran Sodnik, Editor(s)

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