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Proceedings Paper

The future of EUV lithography: continuing Moore's Law into the next decade
Author(s): Jan van Schoot; Kars Troost; Frank Bornebroek; Rob van Ballegoij; Sjoerd Lok; Peter Krabbendam; Judon Stoeldraijer; Jos Benschop; Jo Finders; Hans Meiling; Eelco van Setten; Bernhard Kneer; Peter Kuerz; Winfried Kaiser; Tilmann Heil; Sascha Migura

Paper Abstract

While 0.33NA EUV systems are readying to start volume manufacturing, ASML and Zeiss are ramping up development activities on a 0.55NA EUV exposure tool, extending Moore’s law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the NA; this lens will be paired with new, faster stages and more accurate sensors and the tight focus and overlay control needed for future process nodes. This paper presents an overview of the target specifications, key technology innovations and imaging simulations demonstrating the advantages as compared to 0.33NA and showing the capabilities of ASML’s next generation EUV systems.

Paper Details

Date Published: 19 March 2018
Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830R (19 March 2018); doi: 10.1117/12.2295800
Show Author Affiliations
Jan van Schoot, ASML Netherlands B.V. (Netherlands)
Kars Troost, ASML Netherlands B.V. (Netherlands)
Frank Bornebroek, ASML Netherlands B.V. (Netherlands)
Rob van Ballegoij, ASML Netherlands B.V. (Netherlands)
Sjoerd Lok, ASML Netherlands B.V. (Netherlands)
Peter Krabbendam, ASML Netherlands B.V. (Netherlands)
Judon Stoeldraijer, ASML Netherlands B.V. (Netherlands)
Jos Benschop, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Bernhard Kneer, Carl Zeiss SMT GmbH (Germany)
Peter Kuerz, Carl Zeiss SMT GmbH (Germany)
Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)
Tilmann Heil, Carl Zeiss SMT GmbH (Germany)
Sascha Migura, Carl Zeiss SMT GmbH (Germany)

Published in SPIE Proceedings Vol. 10583:
Extreme Ultraviolet (EUV) Lithography IX
Kenneth A. Goldberg, Editor(s)

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