
Proceedings Paper
Study on photoelectric parameter measurement method of high capacitance solar cellFormat | Member Price | Non-Member Price |
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Paper Abstract
The high efficiency solar cells usually have high capacitance characteristic, so the measurement of their photoelectric performance usually requires long pulse width and long sweep time. The effects of irradiance non-uniformity, probe shielding and spectral mismatch on the IV curve measurement are analyzed experimentally. A compensation method for irradiance loss caused by probe shielding is proposed, and the accurate measurement of the irradiance intensity in the IV curve measurement process of solar cell is realized. Based on the characteristics that the open circuit voltage of solar cell is sensitive to the junction temperature, an accurate measurement method of the temperature of solar cell under continuous irradiation condition is proposed. Finally, a measurement method with the characteristic of high accuracy and wide application range for high capacitance solar cell is presented.
Paper Details
Date Published: 12 January 2018
PDF: 7 pages
Proc. SPIE 10621, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 1062121 (12 January 2018); doi: 10.1117/12.2295674
Published in SPIE Proceedings Vol. 10621:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Liquan Dong, Editor(s)
PDF: 7 pages
Proc. SPIE 10621, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 1062121 (12 January 2018); doi: 10.1117/12.2295674
Show Author Affiliations
Junchao Zhang, National Institute of Metrology (China)
Limin Xiong, National Institute of Metrology (China)
Haifeng Meng, National Institute of Metrology (China)
Yingwei He, National Institute of Metrology (China)
Limin Xiong, National Institute of Metrology (China)
Haifeng Meng, National Institute of Metrology (China)
Yingwei He, National Institute of Metrology (China)
Chuan Cai, National Institute of Metrology (China)
Bifeng Zhang, National Institute of Metrology (China)
Xiaohui Li, Beijing Institute of Technology (China)
Changshi Wang, Beijing Institute of Technology (China)
Bifeng Zhang, National Institute of Metrology (China)
Xiaohui Li, Beijing Institute of Technology (China)
Changshi Wang, Beijing Institute of Technology (China)
Published in SPIE Proceedings Vol. 10621:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Liquan Dong, Editor(s)
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