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Proceedings Paper

Influences of overlap index on Fourier ptychography imaging
Author(s): Honghong Wang; Lu Rong; Dayong Wang; Xu Zhang; Changchao Zhai; Spozmai Panezai; Yunxin Wang; Jie Zhao
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Paper Abstract

Fourier ptychography is a new type of synthetic aperture imaging technique based on phase retrieval method which can improve microscopeic imaging performance beyond the diffraction limit of the employed optical components by illuminating the object with oblique waves of different incident angles where the field of view remains unchanged. illumination angle and the overlap rate of spectrum will have a certain impact on the quality of reconstruction. In this paper, we study the effects of illumination angle and spectral overlap rate on the image quality of Fourier ptychography. The simulation results show that increasing the illumination angle and spectral overlap can improve the resolution, but there is a threshold for the key parameters of spectral overlap rate. The convergence rate decreases when the overlap rate exceeds 70%, and the reconstruction process is more time-consuming due to the high overlap rate. However the results of proposed study shows that an overlap of 60% is the optimal choice to acquire a high-quality recovery with high speed.

Paper Details

Date Published: 12 January 2018
PDF: 8 pages
Proc. SPIE 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology, 106201N (12 January 2018); doi: 10.1117/12.2295548
Show Author Affiliations
Honghong Wang, Beijing Univ. of Technology (China)
Lu Rong, Beijing Univ. of Technology (China)
Dayong Wang, Beijing Univ. of Technology (China)
Xu Zhang, Beijing Univ. of Technology (China)
Changchao Zhai, Beijing Univ. of Technology (China)
Spozmai Panezai, Beijing Univ. of Technology (China)
Yunxin Wang, Beijing Univ. of Technology (China)
Jie Zhao, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 10620:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology
Guohai Situ; Xun Cao; Wolfgang Osten; Liquan Dong, Editor(s)

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