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Proceedings Paper

A model-based approach for the scattering-bar printing avoidance
Author(s): Yaojun Du; Liang Li; Jingjing Zhang; Feng Shao; Christian Zuniga; Yunfei Deng
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Paper Abstract

As the technology node for the semiconductor manufacturing approaches advanced nodes, the scattering-bars (SBs) are more crucial than ever to ensure a good on-wafer printability of the line space pattern and hole pattern. The main pattern with small pitches requires a very narrow PV (process variation) band. A delicate SB addition scheme is thus needed to maintain a sufficient PW (process window) for the semi-iso- and iso-patterns. In general, the wider, longer, and closer to main feature SBs will be more effective in enhancing the printability; on the other hand, they are also more likely to be printed on the wafer; resulting in undesired defects transferable to subsequent processes. In this work, we have developed a model based approach for the scattering-bar printing avoidance (SPA). A specially designed optical model was tuned based on a broad range of test patterns which contain a variation of CDs and SB placements showing printing and non-printing scattering bars. A printing threshold is then obtained to check the extra-printings of SBs. The accuracy of this threshold is verified by pre-designed test patterns. The printing threshold associated with our novel SPA model allows us to set up a proper SB rule.

Paper Details

Date Published: 20 March 2018
PDF: 8 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 105870Q (20 March 2018); doi: 10.1117/12.2295451
Show Author Affiliations
Yaojun Du, Semiconductor Manufacturing International Corp. (China)
Liang Li, Semiconductor Manufacturing International Corp. (China)
Jingjing Zhang, Mentor Graphics (Shanghai) Electronic Technology Co., Ltd. (China)
Feng Shao, Mentor Graphics (Shanghai) Electronic Technology Co., Ltd. (China)
Christian Zuniga, Mentor Graphics a Siemen's Business (United States)
Yunfei Deng, Mentor Graphics a Siemen's Business (United States)


Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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