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Proceedings Paper

A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
Author(s): YaDong Jin; Shizhi Lyu; ZeXi Deng; Cong Lu
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Paper Abstract

With shrinking nodes, as the layout patterns are becoming more and more complicated, OPC accuracy and performance is becoming increasingly challenging. While we are trying to perfect our OPC script to have a clean output without weak points, in a real urgent tape-out scenario, often there will be weak points and we cannot afford the cost to run the OPC again with an updated OPC recipe. Naturally the post OPC repair becomes the only cost-effective choice. The paper studies and compares a few methods for the post OPC weak-points repair: the manual OPC repair flow and traditional repair flow based on the DRC commands. Here, we introduce a novel method based on the eqDRC commands, which are widely used in the design house but have never been used in the post OPC flow. We discuss how to apply the eqDRC into the post OPC repairs and demonstrate its advantages over the traditional methods.

Paper Details

Date Published: 20 March 2018
PDF: 9 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 1058715 (20 March 2018); doi: 10.1117/12.2292695
Show Author Affiliations
YaDong Jin, Semiconductor Manufacturing International Corp. (China)
Shizhi Lyu, Mentor Graphics Shanghai Electronic Technology Co. (China)
ZeXi Deng, Semiconductor Manufacturing International Corp. (China)
Cong Lu, Semiconductor Manufacturing International Corp. (China)

Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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