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Proceedings Paper

A new type industrial total station based on target automatic collimation
Author(s): Dabao Lao; Weihu Zhou; Rongyi Ji; Dengfeng Dong; Zhi Xiong; Jiang Wei
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Paper Abstract

In the case of industrial field measurement, the present measuring instruments work with manual operation and collimation, which give rise to low efficiency for field measurement. In order to solve the problem, a new type industrial total station is presented in this paper. The new instrument can identify and trace cooperative target automatically, in the mean time, coordinate of the target is measured in real time. For realizing the system, key technology including high precision absolutely distance measurement, small high accuracy angle measurement, target automatic collimation with vision, and quick precise controlling should be worked out. After customized system assemblage and adjustment, the new type industrial total station will be established. As the experiments demonstrated, the coordinate accuracy of the instrument is under 15ppm in the distance of 60m, which proved that the measuring system is feasible. The result showed that the total station can satisfy most industrial field measurement requirements.

Paper Details

Date Published: 12 January 2018
PDF: 8 pages
Proc. SPIE 10621, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 1062115 (12 January 2018); doi: 10.1117/12.2292423
Show Author Affiliations
Dabao Lao, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Science (China)
Weihu Zhou, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Science (China)
Rongyi Ji, Academy of Opto-Electronics (China)
Dengfeng Dong, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Science (China)
Zhi Xiong, Hubei Univ. of Technology (China)
Jiang Wei, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Science (China)


Published in SPIE Proceedings Vol. 10621:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Liquan Dong, Editor(s)

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