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Proceedings Paper

An alternative optical metrology system to classical interferometer for complex optical components (Conference Presentation)
Author(s): Isabelle Serre; Rafael Mayer

Paper Abstract

This presentation is a comparison of two technological methods used to test and qualify complex optical components: classical optical interferometry based on Fizeau interferometer and HASO TM Shack-Hartman metrology wavefront sensor with an auto-collimator and its focusing module. Shack-Hartman wavefront sensor consists in a microlens array mounted on a camera (CCD, CMOS, InGaAs sensors) at its focal length. The wavefront will be processed from an integration of all local slopes: the local slopes of the wavefront are calculated by measuring the position of each spot from sub-pupil on the camera. We integrate this metrology wavefront sensor on an optical platform including an auto-collimator (laser diode wavelength to be chosen in the 400 nm to 1100 nm range), a beam-splitter and a focusing module (to be optimised depending on application) so that the system is divergent and can adjust to any optical components size. This system can thus be used on large concave mirror in single pass configuration (standard accuracy of λ/100rms) or transmission optics in double-pass configurations. We will show aberrations cartography of several complex components (biconvex lens, telescope mirror for instance) measured with both technologies, which are fully consistent with Zemax optical simulations software. A big advantage of Shack-Hartman principle is vibration insensitivity, contrary to interferometry. We will emphasize on pros and cons from each technology: wavelength range, chromaticity, price, dimensions, resolution, sensitivity, repeatability, reliability.

Paper Details

Date Published: 14 March 2018
Proc. SPIE 10539, Photonic Instrumentation Engineering V, 105390S (14 March 2018);
Show Author Affiliations
Isabelle Serre, Imagine Optic SA (France)
Rafael Mayer, Imagine Optic SA (France)

Published in SPIE Proceedings Vol. 10539:
Photonic Instrumentation Engineering V
Yakov G. Soskind, Editor(s)

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