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Proceedings Paper

A new method of fabricating the liquid lenticular lens array with Pyrex glass chamber
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Paper Abstract

Liquid lenticular lens array can solve the disadvantages of currently available lenticular type three-dimensional (3D) display with solid lenses in that it enables 2D-3D conversion and has no complex calculations to fabricate. Liquid lenticular lens array needs a chamber which contains liquids and this chamber is usually made of a polymer-based plastic such as poly methyl methacrylate (PMMA) and poly carbonate (PC). However, oil acting as a lens permeates into these plastics because they are porous. For this reason, although the liquid lenticular lens array has many advantages, it is not easy to apply to 3D display system because of its short life time. In this paper, the liquid lenticular lens array with a new chamber using Pyrex glass is presented. A multilayer of metal, Cr/Au/Cr/Au, in combination with AZ2070 photoresist was used for wet etching of glass which was conducted in concentrated hydrofluoric acid (HF). The metal multilayer was deposited by using the thermal evaporator and serves as a mask for glass etching and another Cr/Au/Cr/Au multilayer was deposited on the opposite part of the glass. The Pyrex glass was etched at a rate of 7.5μm/s in 49% HF solution. With the completed Pyrex chamber, the liquid lenticular lens array was fabricated and operation tests were done. We also compared the new liquid lenticular lens array with the Pyrex glass chamber to one with the polymer-based plastic chamber in regard to reliability.

Paper Details

Date Published: 22 February 2018
PDF: 6 pages
Proc. SPIE 10544, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, 105441F (22 February 2018); doi: 10.1117/12.2288039
Show Author Affiliations
Junsik Lee, KAIST (Korea, Republic of)
Junoh Kim, KAIST (Korea, Republic of)
Jee Hoon Sim, KAIST (Korea, Republic of)
Yong Hyub Won, KAIST (Korea, Republic of)

Published in SPIE Proceedings Vol. 10544:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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