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Proceedings Paper

Stacking metal nano-patterns and fabrication of moth-eye structure
Author(s): Jun Taniguchi
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Paper Abstract

Nanoimprint lithography (NIL) can be used as a tool for three-dimensional nanoscale fabrication. In particular, complex metal pattern structures in polymer material are demanded as plasmonic effect devices and metamaterials. To fabricate of metallic color filter, we used silver ink and NIL techniques. Metallic color filter was composed of stacking of nanoscale silver disc patterns and polymer layers, thus, controlling of polymer layer thickness is necessary. To control of thickness of polymer layer, we used spin-coating of UV-curable polymer and NIL. As a result, ten stacking layers with 1000 nm layer thickness was obtained and red color was observed. Ultraviolet nanoimprint lithography (UV-NIL) is the most effective technique for mass fabrication of antireflection structure (ARS) films. For the use of ARS films in mobile phones and tablet PCs, which are touch-screen devices, it is important to protect the films from fingerprints and dust. In addition, as the nanoscale ARS that is touched by the hand is fragile, it is very important to obtain a high abrasion resistance. To solve these problems, a UV-curable epoxy resin has been developed that exhibits antifouling properties and high hardness. The high abrasion resistance ARS films are shown to withstand a load of 250 g/cm2 in the steel wool scratch test, and the reflectance is less than 0.4%.

Paper Details

Date Published: 2 January 2018
PDF: 10 pages
Proc. SPIE 10456, Nanophotonics Australasia 2017, 1045635 (2 January 2018); doi: 10.1117/12.2284580
Show Author Affiliations
Jun Taniguchi, Tokyo Univ. of Science (Japan)

Published in SPIE Proceedings Vol. 10456:
Nanophotonics Australasia 2017
James W. M. Chon; Baohua Jia, Editor(s)

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