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Proceedings Paper

The research on material removal characteristic of reactive ion beam figuring for optics mirrors
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Paper Abstract

The ion beam figuring(IBF) process can produce high accuracy optical surfaces, but the material removal rate is usually lower than 5nm/s and it usually can’t reduce the surface roughness and the middle frequency. This paper study on material removal characteristic of reactive ion beam figuring(RIBF) for optics mirrors, the RIBF process combines physical and chemical effects to remove material, including physical sputtering, spontaneous chemical etching and simultaneous ion bombardment-enhanced desorption. The experiment results indicated that the RIBF process improved the surface quality for optics mirrors by decreased the surface roughness and the middle frequency, and it increased the removal efficiency compare with the IBF process. The research hopes to establish a combined process of RIBF and IBF, and aim to obtain high removal rate and high accuracy surfaces for complex optics mirrors.

Paper Details

Date Published: 24 October 2017
PDF: 8 pages
Proc. SPIE 10460, AOPC 2017: Optoelectronics and Micro/Nano-Optics, 104600Z (24 October 2017); doi: 10.1117/12.2284439
Show Author Affiliations
Zhenpeng Zhang, National Univ. of Defense Technology (China)
Hunan State Key Lab. of Ultra-Precision Machining Technology (China)
Xuhui Xie, National Univ. of Defense Technology (China)
Hunan State Key Lab. of Ultra-Precision Machining Technology (China)
Lin Zhou, National Univ. of Defense Technology (China)
Hunan State Key Lab. of Ultra-Precision Machining Technology (China)
Ying Lu, National Univ. of Defense Technology (China)
Hunan State Key Lab. of Ultra-Precision Machining Technology (China)
Zuocai Dai, National Univ. of Defense Technology (China)
Hunan State Key Lab. of Ultra-Precision Machining Technology (China)


Published in SPIE Proceedings Vol. 10460:
AOPC 2017: Optoelectronics and Micro/Nano-Optics
Min Qiu; Min Gu; Xiaocong Yuan; Zhiping Zhou, Editor(s)

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