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Proceedings Paper

Investigations on the carbon contaminations on the alkali cells of DPAL with hydrocarbon buffer gas
Author(s): Zhiyong Li; Rongqing Tan; Yujie Wang; Qing Ye; Jintian Bian; Wei Huang; Hui Li; Gaoce Han
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Paper Abstract

Diode pumped alkali laser (DPAL) with hydrocarbon buffer gases has the features of low threshold and high efficiency. The chemical reaction between alkali and hydrocarbon gases affects the life time of DPAL. In this paper, a method based on Fourier transform infrared spectroscopy and Lambert-Beer law is adopted to find a safe temperature at which DPAL runs for a long term. A theoretical model is established to figure out ways to reduce the peak temperature in the cell window. The results indicates that 170 °C is a safe temperature. Although the absorbance of the cell window to the pump light and alkali laser is lower, there is temperature increase. Small light-transmitting area and air blowing on the windows can reduce the peak temperature effectively. Cooling the cell window is essential and critical in a long-term running DPAL.

Paper Details

Date Published: 24 October 2017
PDF: 5 pages
Proc. SPIE 10457, AOPC 2017: Laser Components, Systems, and Applications, 104570V (24 October 2017); doi: 10.1117/12.2283254
Show Author Affiliations
Zhiyong Li, Institute of Electronics (China)
Electronic Engineering Institute (China)
Rongqing Tan, Institute of Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Yujie Wang, Institute of Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Qing Ye, Electronic Engineering Institute (China)
Jintian Bian, Electronic Engineering Institute (China)
Wei Huang, Institute of Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Hui Li, Institute of Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Gaoce Han, Institute of Electronics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10457:
AOPC 2017: Laser Components, Systems, and Applications
Shibin Jiang; Lijun Wang; Lan Jiang; Long Zhang, Editor(s)

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