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Proceedings Paper

Key components development progress updates of the 250W high-power LPP-EUV light source
Author(s): Yoshifumi Ueno; Tsukasa Hori; Yasufumi Kawasuji; Yutaka Shiraishi; Tatsuya Yanagida; Kenichi Miyao; Hideyuki Hayashi; Takuya Ishii; Yukio Watanabe; Takeshi Okamoto; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Taku Yamazaki; Noritoshi Itou; Takashi Saitou; Hakaru Mizoguchi
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Paper Abstract

Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volumemanufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.

Paper Details

Date Published: 19 March 2018
PDF: 14 pages
Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 1058328 (19 March 2018);
Show Author Affiliations
Yoshifumi Ueno, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tatsuya Yanagida, Gigaphoton Inc. (Japan)
Kenichi Miyao, Gigaphoton Inc. (Japan)
Hideyuki Hayashi, Gigaphoton Inc. (Japan)
Takuya Ishii, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Takeshi Okamoto, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Noritoshi Itou, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 10583:
Extreme Ultraviolet (EUV) Lithography IX
Kenneth A. Goldberg, Editor(s)

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