
Proceedings Paper
New optical design of exposure system: algorithm for designing irradiating lens and design of exposure system for use in liquid crystal displayFormat | Member Price | Non-Member Price |
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Paper Abstract
A new algorithm for designing an illuminator in a proximity exposure system is discussed. A
relation between aberration of an irradiating lens and the irradiance distribution is studied and it is
found that the lens has to satisfy the expression:h =f tan 0 to achieve uniform distribution.
We designed a new-type illuminator with irradiating lens based on this expression and used a
Fresnel lens as a collimator. This illuminator has high uniformity in the distribution within
over an exposure area of 650mm x 650 mm. It has a collimation angle which is desirable fOr high
resolution; and, experimentally, a resolution of 5 p.m line and space pattern was observed with a gap
of 50 p.m.
Paper Details
Date Published: 1 November 1990
PDF: 17 pages
Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); doi: 10.1117/12.22820
Published in SPIE Proceedings Vol. 1333:
Advanced Optical Manufacturing and Testing
Gregory M. Sanger; Paul B. Reid; Lionel R. Baker, Editor(s)
PDF: 17 pages
Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); doi: 10.1117/12.22820
Show Author Affiliations
Kenji Endo, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Haruo Uemura, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Shin-ichi Nagata, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Haruo Uemura, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Shin-ichi Nagata, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Masayoshi Kobayashi, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Atsushi Abematsu, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Atsushi Abematsu, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Published in SPIE Proceedings Vol. 1333:
Advanced Optical Manufacturing and Testing
Gregory M. Sanger; Paul B. Reid; Lionel R. Baker, Editor(s)
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