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Proceedings Paper

Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity
Author(s): Minoru Sugawara; Kiichi Ishikawa; Hiroichi Kawahira; Ichiro Kagami; Satoru Nozawa
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Paper Abstract

Defect printability of attenuated phase-shifting masks for a dot defect in isolated hole and space patterns is evaluated by EDM (exposure-defocus and mask fabrication latitudes) process windows and process latitude functions which are derived from a series of EDM windows. The allowable defect size is confirmed to be 0.08 (lambda) /NA both for the hole and space patterns with the practical process latitude consideration. By the evaluation of the process latitude functions, it is found that an influence range by the dot defect is extended up to 20 times of the defect size in units on a wafer.

Paper Details

Date Published: 8 December 1995
PDF: 16 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228199
Show Author Affiliations
Minoru Sugawara, Sony Corp. (Japan)
Kiichi Ishikawa, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)
Ichiro Kagami, Sony Corp. (Japan)
Satoru Nozawa, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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