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Proceedings Paper

Manufacturing performance of the ALTA 3000 mask laser writer
Author(s): Brian J. Grenon; D. C. Defibaugh; Donna M. Sprout; C. J. Taft
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Paper Abstract

This paper describes the manufacturing performance of the ALTA 3000 laser writer at the IBM mask fabrication facility in Essex Junction, Vermont. Current mask parametric performance for feature size control (x-bar and 3-sigma), registration and defect density of 4x and 5x reticles is presented. In addition, reliability data and write-time data for typical 64 Mb and 256 Mb reticles are provided.

Paper Details

Date Published: 8 December 1995
PDF: 5 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228180
Show Author Affiliations
Brian J. Grenon, IBM Microelectronics (United States)
D. C. Defibaugh, IBM Microelectronics (United States)
Donna M. Sprout, IBM Microelectronics (United States)
C. J. Taft, IBM Microelectronics (United States)

Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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