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Proceedings Paper

Actual use of phase-shift mask
Author(s): Yoshiro Yamada; Hiromasa Unno; Kazuaki Chiba; Eisei Karikawa; Yasutaka Kikuchi; Yusuke Hattori; Katsuhiro Kinemura
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Paper Abstract

Attenuate phase shift masks have been developed for practical use because there are less limitations on the design, and mask defect repairs are easier. However, phase shift mask manufacturing technology improvement is needed not only for control of phase shift or transmission, but also higher accuracy and more precise patterns such as KrF application or for 4X reticle applications. This report shows the manufacturing method of the MoSiON attenuate phase shift mask with Cr border and its quality encourages its evaluation as a promising technique for finer patterns.

Paper Details

Date Published: 8 December 1995
PDF: 7 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228179
Show Author Affiliations
Yoshiro Yamada, Toppan Printing Co., Ltd. (Japan)
Hiromasa Unno, Toppan Printing Co., Ltd. (Japan)
Kazuaki Chiba, Toppan Printing Co., Ltd. (Japan)
Eisei Karikawa, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Yusuke Hattori, Toppan Printing Co., Ltd. (Japan)
Katsuhiro Kinemura, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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