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Proceedings Paper

Fabrication of overlaid nanopattern arrays for plasmon memory
Author(s): Takao Okabe; Hisahiro Wadayama; Jun Taniguchi
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Paper Abstract

Stacking technique of nanopattern array is gathering attention to fabricate next generation data storage such as plasmon memory. This technique provides multi- overlaid nanopatterns which made by nanoimprint lithography. In the structure, several metal nanopatterned layer and resin layer as a spacer are overlaid alternately. The horizontal position of nanopatterns to under nanopatterns and thickness of resin layer as spacer should be controlled accurately, because these parameters affect reading performance and capacity of plasmon memory. In this study, we developed new alignment mark to fabricate multi- overlaid nanopatterns. The alignment accuracy with the order of 300 nm was demonstrated for Ag nanopatterns in 2 layers. The alignment mark can measure the thickness of spacer. The relationship of spacer thickness and position of scale bar on the alignment mark was measured. The usefulness of the alignment mark for highdensity plasmon memory is shown.

Paper Details

Date Published: 2 January 2018
PDF: 7 pages
Proc. SPIE 10456, Nanophotonics Australasia 2017, 1045655 (2 January 2018); doi: 10.1117/12.2281591
Show Author Affiliations
Takao Okabe, Tokyo Univ. of Science (Japan)
Hisahiro Wadayama, Tokyo Univ. of Science (Japan)
Jun Taniguchi, Tokyo Univ. of Science (Japan)

Published in SPIE Proceedings Vol. 10456:
Nanophotonics Australasia 2017
James W. M. Chon; Baohua Jia, Editor(s)

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