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Proceedings Paper

Platinum coating of an x-ray mirror for SR lithography
Author(s): Sei-ichi Itabashi; Ikuo Okada; Takashi Kaneko; Seitaro Matsuo; Hideo Yoshihara
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Paper Abstract

Three kinds of deposition methods : ECR ( Electron Cycloiron Resonance ) sputtering, Ion Beam Sputtering (IBS) and conventional Vacuum Evaporation (VE) are compared to obtain highly reflective X-ray mirrors. ECR sputtered platinum film shows the highest X-ray reflectivity, because it exhibits the smallest surface roughness, a. The surface roughness and morphology of Pt films are investigated using SEM, STM and X-ray reflectivity measurements. The surface roughness of VE films is more than 0.8 nm. ECR and lBS films have optimum thicknesses which yield minimum surface roughness. The minimum surface roughness of the ECR film is 0.30 nm and X-ray reflectivity of this film does not vary before and after baking ( 250°C x 40 hours). ECR sputtered film is therefore the best one for preparing high quality X-ray mirrors.

Paper Details

Date Published: 1 November 1990
PDF: 10 pages
Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990);
Show Author Affiliations
Sei-ichi Itabashi, NTT/LSI Labs. (Japan)
Ikuo Okada, NTT/LSI Labs. (Japan)
Takashi Kaneko, NTT/LSI Labs. (Japan)
Seitaro Matsuo, NTT/LSI Labs. (Japan)
Hideo Yoshihara, NTT/LSI Labs. (Japan)

Published in SPIE Proceedings Vol. 1333:
Advanced Optical Manufacturing and Testing
Gregory M. Sanger; Paul B. Reid; Lionel R. Baker, Editor(s)

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