Share Email Print
cover

Proceedings Paper

Aerial image ORC checks and their correlation to wafer-edge yield limitation for metals: a study and an OPC resolution
Author(s): Tamer Desouky; Yixiao Zhang; Mark Terry; Haizhou Yin; Muhammed Pallachali; Nicolai Petrov; Teck Jung Tang; Fadi Batarseh; Ahmed Khalil; Pietro Babighian; Rohan Deshpande; Deborah Ryan; Rao Desineni; Shweta Shokale; Feng Wang; Sang-Kee Eah; Jiechang Hou
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Lithography process variation as well as etch and topography have always been a stubborn challenge for advanced technology nodes, i.e. 14nm and beyond. This variability usually results in defects aggregating around the edge of the wafer and leading to yield loss. A very tight process control is the logical resolution for such issues, nevertheless it might not be possible, or it may slow down the whole design to silicon cycle time. Another degree of difficulty is detecting these defects in ORC and concluding an OPC fix. In this paper, we show that aerial image ORC checks could provide a very useful insight to these defects ahead of time, and that they correlate well with silicon defects highlighted by CFM scan. This early detection upstream enables us to conclude a generic OPC fix for such issues and also improves the total OPC process-window enhancement and eliminates these defects on silicon.

Paper Details

Date Published: 16 October 2017
PDF: 9 pages
Proc. SPIE 10451, Photomask Technology 2017, 104511L (16 October 2017);
Show Author Affiliations
Tamer Desouky, GLOBALFOUNDRIES Inc. (United States)
Yixiao Zhang, GLOBALFOUNDRIES Inc. (United States)
Mark Terry, GLOBALFOUNDRIES Inc. (United States)
Haizhou Yin, GLOBALFOUNDRIES Inc. (United States)
Muhammed Pallachali, GLOBALFOUNDRIES Inc. (United States)
Nicolai Petrov, GLOBALFOUNDRIES Inc. (United States)
Teck Jung Tang, GLOBALFOUNDRIES Inc. (United States)
Fadi Batarseh, GLOBALFOUNDRIES Inc. (United States)
Ahmed Khalil, GLOBALFOUNDRIES Inc. (United States)
Pietro Babighian, GLOBALFOUNDRIES Inc. (United States)
Rohan Deshpande, GLOBALFOUNDRIES Inc. (United States)
Deborah Ryan, GLOBALFOUNDRIES Inc. (United States)
Rao Desineni, GLOBALFOUNDRIES Inc. (United States)
Shweta Shokale, GLOBALFOUNDRIES Inc. (United States)
Feng Wang, GLOBALFOUNDRIES Inc. (United States)
Sang-Kee Eah, GLOBALFOUNDRIES Inc. (United States)
Jiechang Hou, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10451:
Photomask Technology 2017
Peter D. Buck; Emily E. Gallagher, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray