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Proceedings Paper

VSB fracture optimization for mask write time reduction
Author(s): Lei Sun; Dan Hung; John Burns; Bill Moore
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Paper Abstract

Mask Data Preparation (MDP) fracture takes IC layout data and decomposes (“fractures”) complex polygons into rectilinear and trapezoidal primitives suitable for mask writers. For rectilinear polygons, the total number of decomposed figures from a given polygon is bounded mathematically in terms of the polygon’s reflex vertex count. Such geometric-based decomposition algorithms can be further optimized by considering parameters associated with VSB mask writers. This paper describes our efforts to reduce mask write time while maintaining CD quality by further optimizing the underlying algorithms. The optimization results are statistically analyzed with variation of shot size and sliver size. In addition, a case study is conducted to explore how sliver size specification impacts both shot count and fracturing quality.

Paper Details

Date Published: 16 October 2017
PDF: 11 pages
Proc. SPIE 10451, Photomask Technology 2017, 1045105 (16 October 2017);
Show Author Affiliations
Lei Sun, Synopsys Inc. (United States)
Dan Hung, Synopsys Inc. (United States)
John Burns, Synopsys Inc. (United States)
Bill Moore, Synopsys Inc. (United States)


Published in SPIE Proceedings Vol. 10451:
Photomask Technology 2017
Peter D. Buck; Emily E. Gallagher, Editor(s)

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