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Proceedings Paper

Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants
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Paper Abstract

Since the conception of the Generalized Gaussian Constants, and its foundation the Gaussian Bracket, is a powerful tool in analyzing complex optical systems, though up until now it has seen use almost exclusive in designing zoom lens systems. This study investigates the correspondence of Generalized Gaussian Constants to optical system properties, and demonstrates a design method in particular for the reflective projection system in EUV lithography. The detailed four-mirror design is a proof of concept of the design method, and a more complex eight-mirror design demonstrates the capacity for higher design complexity.

Paper Details

Date Published: 16 October 2017
PDF: 7 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045021 (16 October 2017);
Show Author Affiliations
Li-Jen Hsiao, National Taiwan Univ. (Taiwan)
Hoang-Yan Lin, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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